| abstract |
The present invention provides a photosensitive resin composition, a dry film, and a pattern forming method using the dry film, which are used for permanent films and do not use a photosensitizer containing halongen. SOLUTION: (A) a polymer having an alicyclic epoxy group, (B) a monomer having a radical polymerizable group, (C) a radical polymerization initiator, and (D) a photosensitizer that generates sulfonic acid by light irradiation. Even if it is used for permanent film applications, it contains a photosensitive resin composition that does not corrode materials used for fine parts and the like, and therefore can be suitably used as a photosensitive resin composition for permanent film applications. . [Selection figure] None |