http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010211070-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2009-03-11^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_749d48f19b19df8fd80958517557e671 |
| publicationDate | 2010-09-24^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2010211070-A |
| titleOfInvention | Positive resist composition and resist pattern forming method |
| abstract | A positive resist composition and a resist pattern forming method using the positive resist composition are provided. A positive resist composition comprising a base component (A) whose solubility in an alkaline developer is increased by the action of an acid, and an acid generator component (B) that generates an acid upon exposure, The base component (A) includes a polymer compound (A1-1) having a structural unit (a0-1) containing a cyclic group containing —SO 2 — in the ring skeleton, and the polymer compound (A1- 1) The high molecular compound which has the same structural unit (a0-1) as the structural unit which has, and the content rate (mol%) of a structural unit (a0-1) differs from the said polymeric compound (A1-1). A positive resist composition containing (A1-2). [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I741042-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018072643-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011197628-A |
| priorityDate | 2009-03-11^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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