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filingDate 2007-10-19^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2010-04-30^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2010513704-A
titleOfInvention Mixed chromium oxide-metal chromium sputtering target
abstract An AC or DC sputtering target for depositing a chromium suboxide thin film on a substrate contains chromium oxide, metallic chromium, and incorporated oxygen. The target resistivity is 200 ohms. cm or less. The target can be made of a combination of chromium oxide powder and metallic chromium such as powder, or it can start with 100% chromium oxide or suboxide material, and the material can be used before or during the target fabrication process. Either of them can be exposed to a reducing atmosphere and reduced to a certain proportion of chromium oxide and / or suboxide material to metallic chromium and retained oxygen. With such a target, a thin film of chromium oxide can be obtained by performing a sputtering process using only inert argon gas.
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