http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010513704-A
Outgoing Links
Predicate | Object |
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classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F2998-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F2999-00 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3414 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22C29-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-083 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22C1-051 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F3-15 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22C29-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F5-00 |
filingDate | 2007-10-19^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2010-04-30^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2010513704-A |
titleOfInvention | Mixed chromium oxide-metal chromium sputtering target |
abstract | An AC or DC sputtering target for depositing a chromium suboxide thin film on a substrate contains chromium oxide, metallic chromium, and incorporated oxygen. The target resistivity is 200 ohms. cm or less. The target can be made of a combination of chromium oxide powder and metallic chromium such as powder, or it can start with 100% chromium oxide or suboxide material, and the material can be used before or during the target fabrication process. Either of them can be exposed to a reducing atmosphere and reduced to a certain proportion of chromium oxide and / or suboxide material to metallic chromium and retained oxygen. With such a target, a thin film of chromium oxide can be obtained by performing a sputtering process using only inert argon gas. |
priorityDate | 2006-10-20^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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