http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010532915-A

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filingDate 2008-07-01^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2010-10-14^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2010532915-A
titleOfInvention Field emission array having carbon microstructures and method of manufacturing the same
abstract A method of manufacturing a field emission array having a carbon microstructure according to the present invention includes a photomask deposition step of depositing a photomask having a pattern groove on the surface of a transparent substrate, and a photomask that deposits a negative photoresist on the surface of the photomask. A resist attaching step, and an exposure step of irradiating light from the opposite side of the transparent substrate photomask attached portion and curing a part of the negative photoresist by light irradiated to the negative photoresist through the pattern groove; and A development step for removing a non-exposed portion of the negative photoresist to form a fine structure obtained by curing the negative photoresist, a thermal decomposition step for heating and carbonizing the fine structure, and a fine step. A cathode for attaching a cathode for supplying voltage to the surface of the transparent substrate on which the structure is formed. Characterized by comprising encompass and de deposition steps. According to the present invention, a carbon microstructure used as an electron-emitting device can be manufactured easily and at low cost. [Selection] Figure 18
priorityDate 2008-06-30^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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