| abstract |
An actinic ray-sensitive or radiation-sensitive resin composition having excellent etching resistance and stability against PED, and a pattern forming method using the same. An actinic ray-sensitive or radiation-sensitive resin composition according to the present invention includes a resin containing a repeating unit having a group that decomposes by the action of an acid to generate an alcoholic hydroxy group, and an actinic ray or radiation. And a compound capable of generating an acid having a pKa ≧ −1.5 by irradiation. [Selection figure] None |