| abstract |
Provided is a radiation-sensitive resin composition with high practicality that can form a finer pattern easily and efficiently and can be applied to a semiconductor manufacturing process. (A) A resin having a repeating unit represented by the general formula (1), (D) an acid generator, and (E) a photodegradable base represented by the general formula (8). Radiation-sensitive resin composition to be contained (however, in general formula (1), R 1 represents a hydrogen atom or a methyl group, and R 2 represents a hydrocarbon group. In general formula (8), R 18 to R 20 are independently of one another, an alkyl group, an alkoxyl group, a hydroxyl group or a halogen atom,, Z - is OH -, R-COO -, R-SO 3 - shows the like anions).. [Selection figure] None |