| abstract |
The present invention provides a resist composition useful for EUV or EB, a method for forming a resist pattern using the resist composition, and a polymer compound useful for the resist composition. A resin component (A) containing a resin component (A1) having a structural unit (a0) represented by the following general formula (a0-0-1) is contained, and the action of an acid generated by exposure A resist composition for EUV or EB whose solubility in a developer changes. [Chemical 1] [Selection figure] None |