http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013008890-A

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filingDate 2011-06-27^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2013-01-10^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2013008890-A
titleOfInvention Semiconductor device and manufacturing method thereof
abstract A semiconductor device having high channel mobility and a method for manufacturing the same are provided. The substrate has a surface SR made of a semiconductor having a hexagonal single crystal structure of polytype 4H. The surface SR of the substrate is a first surface S1 having a surface orientation (0-33-8), and a second surface having a surface orientation that is connected to the first surface S1 and different from the surface orientation of the first surface S1. S2 and this are provided alternately. The gate insulating film is provided on the surface SR of the substrate. The gate electrode is provided on the gate insulating film. [Selection] Figure 3
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