http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013023589-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cebc9740ef706cde29e885504f274ffa |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-18 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F6-10 |
| filingDate | 2011-07-21^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea1339f90632dfffa033baea49f13782 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99acb4b074094251f50ea6452c55f441 |
| publicationDate | 2013-02-04^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2013023589-A |
| titleOfInvention | Method for producing polymer for electronic material, method for producing resist composition, and method for producing substrate on which pattern is formed |
| abstract | Provided is a method for producing a polymer for electronic materials, which can efficiently reduce the residual monomer contained in the polymer. A process for obtaining a polymerization reaction solution by radical polymerization of monomers using a polymerization initiator in the presence of a polymerization solvent, and concentrating the obtained polymerization reaction solution under reduced pressure, The manufacturing method of the polymer for electronic materials which has the process of removing a monomer. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018040824-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10833272-B2 |
| priorityDate | 2011-07-21^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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