http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013109875-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7fbcdb105756f552ddf2e9ae2cfcf40a http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_51ea8e921747f313703958e64d2aa3a7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 |
| filingDate | 2011-11-18^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d6bbdd0841e1751f347872f2b58e070b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3b7876f62a8964f1ca2b40e6ad90f27 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d399c8b4ba28b9c2aced5626607cb4cb |
| publicationDate | 2013-06-06^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2013109875-A |
| titleOfInvention | Microwave plasma processing equipment |
| abstract | It is an object of the present invention to provide a microwave plasma processing apparatus that can easily perform a predetermined reforming process regardless of the shape of a processing target surface of a processing target. A microwave plasma processing apparatus (1) includes an inner cylinder part (30), an outer cylinder part (31), a waveguide path (33) disposed between the inner cylinder part (30) and the outer cylinder part (31), and a waveguide path (33). And a slit 36 having a narrower axial width than that of the waveguide 33 and a gas supply unit 35 for supplying a plasma generating gas to the slit 36. [Selection] Figure 2 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019058855-A1 |
| priorityDate | 2011-11-18^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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