| abstract |
A resist pattern forming method capable of forming a negative pattern with a high resolution and a good shape, and a resist composition suitable for use in the resist pattern forming method. A step of forming a resist film using a resist composition containing a base component (A) and a photobase generator component; a step of exposing the resist film; a step of baking after exposure; A resist pattern forming method including a step of developing and forming a negative resist pattern in which an unexposed portion is dissolved and removed, and a resist composition used therefor, wherein the component (A) is a structural unit containing an acid-decomposable group , A structural unit containing —SO 2 — or a lactone-containing cyclic group, and a polymer compound having a structural unit represented by formula (a3-1) (however, 10 mol% or less). [Selection] Figure 1 |