http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013115026-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_063a1b324005ddc15e16e7529c6258c4 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-30 |
| filingDate | 2011-12-01^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bca1b08fa4b8301e69528f0f4ed8de50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e40d64563d6816c976a31223566996b6 |
| publicationDate | 2013-06-10^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2013115026-A |
| titleOfInvention | Plasma processing apparatus and plasma processing method |
| abstract | When a substrate is subjected to high temperature heat treatment in the vicinity of the surface of the substrate uniformly for a very short time, or when the substrate is irradiated with plasma by a reactive gas or plasma and a reactive gas flow at the same time, the substrate is subjected to low temperature plasma treatment. It is an object of the present invention to provide a plasma processing apparatus and method capable of processing the entire desired processing region of a material in a short time. In an inductively coupled plasma torch unit, a spiral coil is disposed in a refrigerant flow path surrounded by a first metal plate, a second metal plate, and a refrigerant case, and a plasma is provided at the bottom. A spout 8 is provided. The second metal plate 5 is provided with a quartz window 18 for efficiently transmitting high-frequency power. While supplying gas to the space 7 inside the long chamber surrounded by the second metal plate 5 and the third metal plate 6, high frequency power is supplied to the spiral coil 3 to generate plasma in the space 7 inside the long chamber. Generated and irradiated onto the substrate 2. [Selection] Figure 1 |
| priorityDate | 2011-12-01^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
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