| abstract |
An object of the present invention is to provide a polishing composition capable of suppressing generation of a step due to etching on a surface of a polishing object when a polishing object having a portion containing a III-V group compound material is polished. To do. The polishing composition of the present invention contains an oxidizing agent and an anticorrosive agent. Anticorrosives are nitrogen-containing organic compounds such as 1H-1,2,4-triazole and benzotriazole, or organic compounds having a carboxyl group, such as malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, maleic acid. Dicarboxylic acids such as phthalic acid, malic acid and tartaric acid, and tricarboxylic acids such as citric acid are preferred. [Selection figure] None |