| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0751
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G79-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2012-10-30^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e0a5be1d9b10e1384cfd329c0747c50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d15835feeb1a7bd77386e5fa4161cf2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90276c3fc7ed227be052968bb970bcd8 |
| publicationDate |
2013-07-11^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2013137512-A |
| titleOfInvention |
Silicon-containing resist underlayer film forming composition and pattern forming method |
| abstract |
[PROBLEMS] To provide (1) a pattern that has good adhesion, and (2) silicon that can be used as a good dry etching mask between a photoresist film as an upper layer of a silicon-containing film and an organic film as a lower layer. An object of the present invention is to provide a silicon-containing resist underlayer film forming composition and a pattern forming method capable of forming a containing film and (3) suppressing deformation of the upper layer resist during dry etching of the silicon-containing film. To do. At least one compound (A) selected from the group consisting of an organoboron compound represented by the following general formula (1) and a condensate thereof, and a silicon compound (B) represented by the following general formula (2) A composition for forming a silicon-containing resist underlayer film comprising a condensate and / or a hydrolysis condensate of a mixture containing at least one kind. R 1 m0 B (OH) m1 (OR) (3-m0-m1) (1) R 10 m10 R 11 m11 R 12 m12 Si (OR 13) (4-m10-m11-m12) (2) [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9902875-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9880470-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023162780-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9791779-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160040435-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101999384-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101893641-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014063038-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016074774-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016074772-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018516998-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160112945-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016081065-A |
| priorityDate |
2011-11-29^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |