http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013167826-A

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publicationDate 2013-08-29^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2013167826-A
titleOfInvention Actinic ray-sensitive or radiation-sensitive resin composition, pattern formation method and resist film using the composition, and electronic device manufacturing method and electronic device using the same
abstract An actinic ray-sensitive or radiation-sensitive resin composition excellent in sensitivity, resolution, roughness performance and stability over time, and generating little outgas, a pattern forming method and a resist film using the composition, and these A method of manufacturing an electronic device using the above and an electronic device are provided. An actinic ray-sensitive or radiation-sensitive resin composition containing a compound capable of generating an acid upon irradiation with an actinic ray or radiation represented by the following general formula (Z1). [Selection figure] None
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