http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013235211-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b64ca2be1fccb81cb67000a672d396e9 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-03 |
filingDate | 2012-05-11^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_453d75715716ba231bd9f38e6de43f71 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_753661400184575e6156aadb5db422d8 |
publicationDate | 2013-11-21^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2013235211-A |
titleOfInvention | Reaction development image forming method |
abstract | The present invention provides a negative photoresist based on a polyimide resin that uses an alkaline aqueous solution as a developer and has a short development time. A photoresist layer containing a photosensitive resin composition is provided on a substrate, masked with a desired pattern, ultraviolet rays are irradiated on the pattern surface, and the photoresist layer is treated with a developer that is an alkaline aqueous solution. As a result, a negative photoresist is formed. This photosensitive resin composition contains a polyimide resin, an anion regenerating agent, and a photoacid generator. This polyimide resin is obtained by reacting an acid dianhydride and a diamine compound, and this acid dianhydride is an alicyclic ring. Contains the formula acid dianhydride. The acid dianhydride may be a mixture of an alicyclic acid dianhydride and an aromatic acid dianhydride. The ratio (molar ratio) between the alicyclic acid dianhydride and the aromatic acid dianhydride is preferably 8: 2 to 5: 5. The diamine compound is preferably an aromatic diamine. [Selection figure] None |
priorityDate | 2012-05-11^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
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