http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015052647-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cebc9740ef706cde29e885504f274ffa |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2013-09-05^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99acb4b074094251f50ea6452c55f441 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a28df267ad3da091f142e9e1a8b48c7e |
| publicationDate | 2015-03-19^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2015052647-A |
| titleOfInvention | Method for evaluating polymer for semiconductor lithography, and method for producing polymer for semiconductor lithography including the evaluation method |
| abstract | Provided is a method capable of simply and accurately evaluating the solubility of a polymer for lithography in a solvent at a low temperature. A method for evaluating a polymer for semiconductor lithography comprising the following steps (1) and (2): Step (1) comprising a polymer for semiconductor lithography, a good solvent for the polymer, and a poor solvent for the polymer. , A step of preparing a test solution in which no polymer is precipitated, and a step (2) a step of measuring the temperature at which the polymer is precipitated by lowering the temperature of the test solution and evaluating the solubility of the polymer at a low temperature. [Selection figure] None |
| priorityDate | 2013-09-05^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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