| abstract |
An actinic ray-sensitive or radiation-sensitive resin composition having a large focus tolerance and excellent developability, a pattern forming method using the composition, a method for manufacturing an electronic device, and an electronic device are provided. To do. A resin (P) containing a repeating unit (i) having a group represented by the following general formula (1), and a compound capable of generating an acid upon irradiation with an actinic ray or radiation represented by a specific formula , Containing actinic ray-sensitive or radiation-sensitive resin composition. [Selection figure] None |