http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015185455-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H2007-025 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61N5-1077 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61N2005-1087 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H13-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H7-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G21K5-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H13-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H7-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61N5-10 |
| filingDate | 2014-03-25^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c2e1e999409db4bd5d75da4f0fdc9f0f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9e89a6545ad54e4885bbe228b897368 |
| publicationDate | 2015-10-22^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2015185455-A |
| titleOfInvention | Charged particle beam irradiation system and beam extraction method thereof |
| abstract | A charged particle beam irradiation system capable of suppressing the generation of an output beam current ripple caused by a high-frequency voltage applied to an extraction high-frequency electrode that increases the betatron oscillation amplitude of the ion beam and improving the dose rate. provide. A high frequency voltage Fext applied to an emission high frequency electrode is applied to increase a vibration amplitude within a range not exceeding a stability limit so that a beam circulating in the synchrotron is not emitted outside the synchrotron. A voltage (supply high-frequency voltage) Fs and a high-frequency voltage (output high-frequency voltage) Fe applied to emit a circular beam diffused to the vicinity of the stability limit 15 by the supply high-frequency voltage Fs from the synchrotron. = Fs + Fe. In addition, the intensity of the supply high-frequency voltage Fs and the intensity of the extraction high-frequency voltage Fe are controlled by appropriately combining them according to the target value of the ion beam current emitted outside the synchrotron and its change over time. [Selection] Figure 2 |
| priorityDate | 2014-03-25^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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