| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a18f4049bce3793718cf7b9e92bf268c |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T137-0318
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P10-25
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T137-0402
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T137-6416
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F10-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T137-87153
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F5-10 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F17D1-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45572
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45574
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B25-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4401 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate |
2015-06-02^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5485e445f9c4250a2d03fe2bb22317c7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07037a4b58ceaf5c1651460ff635e5bb |
| publicationDate |
2016-01-12^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2016004998-A |
| titleOfInvention |
Gas flow flange for rotating disk reactor for chemical vapor deposition |
| abstract |
A gas flow flange for a rotating disk reactor for chemical vapor deposition is provided. A gas flow flange 200 for a rotating disk reactor for chemical vapor deposition is disposed within a first section 202, the first section, and parallel to a top surface of the first section. A plurality of first gas channels 206 and a plurality of second gas channels disposed perpendicular to the top surface of the first section and extending from the top surface of the first section to the bottom surface of the first section. The second section 204 includes a gas channel 210 and a fluid cooling conduit 160. [Selection] Figure 2 |
| priorityDate |
2014-06-17^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |