| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-12 |
| filingDate |
2015-07-28^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb1839c842dea679d210afc09fbad701
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5756d88bd4de1b02e40fcc310564b566
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 |
| publicationDate |
2016-03-17^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2016035565-A |
| titleOfInvention |
Resist composition |
| abstract |
A resist composition capable of forming a resist pattern with excellent resist pattern shape and focus margin is provided. An aromatic hydrocarbon having 6 to 20 carbon atoms which may have one or more groups selected from the group consisting of a hydroxy group and a carboxyl group in the structural unit represented by the formula (I0) and a side chain. A resist composition comprising a resin (A1) comprising a structural unit comprising a polymerizable compound having a group and a structural unit having an acid labile group, and an acid generator. [In Formula (I0), R 1 represents a C 1-6 alkyl group or the like which may have a halogen atom, and A 1 represents a single bond or the like. ] [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018062509-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7026473-B2 |
| priorityDate |
2014-07-31^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |