http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016035568-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2015-07-28^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb1839c842dea679d210afc09fbad701 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5756d88bd4de1b02e40fcc310564b566 |
| publicationDate | 2016-03-17^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2016035568-A |
| titleOfInvention | Method for producing resist pattern |
| abstract | A method of manufacturing a resist pattern having a good pattern shape and focus margin is provided. A method for producing a resist pattern comprising steps (1) to (5). (1) A resist composition containing a structural unit (II) at 0.5 mol% or more and 12 mol% or less and containing a structural unit having an acid labile group and an acid generator on a substrate. Applying process. (2) a step of drying the resist composition after coating to form a composition layer having a thickness of 100 nm or less, (3) a step of subjecting the composition layer to immersion exposure with an ArF excimer laser, and (4) after exposure. A step of heating the composition layer, (5) a step of developing the heated composition layer with a negative developer. [Selection figure] None |
| priorityDate | 2014-07-31^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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