http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016079296-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cebc9740ef706cde29e885504f274ffa
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-01
filingDate 2014-10-17^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed6177de12e19d12eba0d166cedc94fe
publicationDate 2016-05-16^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2016079296-A
titleOfInvention Manufacturing method and manufacturing apparatus for material for semiconductor lithography
abstract The present invention provides a manufacturing method and a manufacturing apparatus capable of manufacturing a material for semiconductor lithography with a reduced metal impurity concentration. A method for manufacturing a semiconductor lithography material, which is a polymer for semiconductor lithography, a polymer solution, or a composition containing the polymer, and is a liquid substance in a liquid supply pipe formed by connecting a plurality of pipe members. A connecting member selected from the group consisting of the following (1) to (3) is arranged at a portion where the piping members are connected to each other in the liquid supply piping. A method for manufacturing a material for semiconductor lithography. (1) A connecting member made of perfluoroelastomer. (2) A connecting member made of fluororubber. (3) A connection member in which the surface of a rubber substrate is coated with a perfluoro resin. [Selection figure] None
priorityDate 2014-10-17^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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