| abstract |
(A) An onium salt compound represented by formula (1) or (2), and (B) a side chain containing a repeating unit of a phenolic hydroxyl group, decomposed by the action of an acid, and dissolved in an alkaline developer. A chemically amplified positive resist composition for exposure to high energy rays, which contains a resin that increases the solubility of. [Z + is a sulfonium cation or iodonium cation having a specific structure. [Effect] It is possible to effectively control the acid diffusion at the time of exposure, and it is possible to obtain a pattern having extremely high resolution and reduced LER at the time of pattern formation. [Selection figure] None |