http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016194087-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cebc9740ef706cde29e885504f274ffa |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F6-06 |
| filingDate | 2016-07-08^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17de1b2a5e8ea66f9432e3137d1177d1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e31ecd5de640fea16badd51f869a1408 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec9757d971b7b45c31087956b7dc5b73 |
| publicationDate | 2016-11-17^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2016194087-A |
| titleOfInvention | Lithographic polymer or lithographic polymer solution manufacturing method |
| abstract | An object of the present invention is to provide a lithographic polymer or a lithographic polymer solution manufacturing method capable of suppressing an increase in the amount of metal impurities due to contamination in the manufacturing process to 2 ppb or less. A polymerization raw material is handled in an atmosphere of class 8 or lower, transferred to a polymerization kettle without being in contact with outside air exceeding class 8, and a monomer is polymerized in the polymerization kettle. The polymer solution for lithography is obtained, and the polymer for lithography or the polymer solution for lithography is transferred to an atmosphere of class 8 or less without being contacted with outside air exceeding class 8, and the container is filled in the atmosphere. Thus, the concentration of each metal impurity of Na, Ca, Fe, and Zn in the lithography polymer or the lithography polymer solution shall satisfy the condition (i). (I): Na concentration is theoretical value +2 ppb or less, Ca concentration is theoretical value +2 ppb or less, Fe concentration is less than theoretical value +1 ppb, and Zn concentration is theoretical value +1 ppb or less. [Selection figure] None |
| priorityDate | 2016-07-08^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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