http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017081990-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C233-92 |
| filingDate | 2017-01-13^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_80aad4f24f996497f9eae0b0e77b42ee http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c64bf1e627002819df6a4a811220b667 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24ed4c4b51484cc4d61088e6f9844266 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52cce40b8476edb4278cec332665b093 |
| publicationDate | 2017-05-18^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2017081990-A |
| titleOfInvention | Compound |
| abstract | [PROBLEMS] To provide a resist composition excellent in sensitivity, resolution, lithography characteristics and etching resistance, a compound useful for the resist composition, and a method for forming a resist pattern using the resist composition. A compound represented by the general formula (1) ′. In formula, R is a hydrogen atom, a C1-C5 alkyl group, or a C1-C5 halogenated alkyl group. R 1 is a sulfur atom or an oxygen atom. R 2 is a single bond, a group represented by —Y 21 —O—Y 22 —, a group represented by — [Y 21 —C (═O) —O] m ′ —Y 21 —, —C (= O) a group represented by —O—Y 22 — or a group represented by —Y 21 —O—C (═O) —Y 22 —. Y 21 and Y 21 are each independently a divalent hydrocarbon group which may have a substituent. m 'is an integer of 0-3. Y is a perfluoroaromatic hydrocarbon group. [Chemical 1] [Selection figure] None |
| priorityDate | 2017-01-13^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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