http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017119881-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c8d4dc7bd1a30d8fda907fceaeb4e69
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F6-12
filingDate 2017-03-13^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9321233e237e29e730fc4a09108724fc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed69789deeeb8a675b26d890f504ef95
publicationDate 2017-07-06^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2017119881-A
titleOfInvention Lithographic polymer manufacturing method, resist composition manufacturing method, and pattern-formed substrate manufacturing method
abstract An object of the present invention is to improve the solubility in a solvent while suppressing the heat history given to a polymer for lithography, improve the productivity, and improve the efficiency of a stable quality polymer by shortening the process passage time. Produces well. A polymerization step of radically polymerizing a monomer using a polymerization initiator in the presence of a polymerization solvent to obtain a polymerization reaction solution, and a solution containing a polymer obtained by the polymerization reaction step, A lithography process comprising a recovery step of dropping the polymer over a poor solvent over 40 minutes to precipitate the polymer and obtaining the precipitate, and satisfying the following formula (1) in the recovery step of obtaining the precipitate: Manufacturing method of coalescence. 0.33 ≦ solid content mass of polymer in polymerization reaction solution (g) / (poor solvent capacity (L) × mixing time of polymerization reaction solution with poor solvent (min)) ≦ 0.65 Formula ( 1) [Selection figure] None
priorityDate 2017-03-13^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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