http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018066010-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-06
filingDate 2017-11-24^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed69789deeeb8a675b26d890f504ef95
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f94fbacd32a6cdff2cd5a21e7d4268d8
publicationDate 2018-04-26^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2018066010-A
titleOfInvention Method for producing polymer for semiconductor lithography
abstract Disclosed is a method for stably producing a polymer for semiconductor lithography by dissolving a solid monomer raw material in another raw material and supplying it in a solution state. A method for producing a polymer for semiconductor lithography, comprising the following steps (1) and (2), wherein the following step (2) is dropping polymerization, and the melting point of the following monomer (A) is 10 ° C. or higher. . (1) A step of supplying a polymerization raw material in which a monomer (A) having a melting point of 5 ° C. or higher is dissolved in a polymerization solvent and / or another monomer (B) to a preparation kettle; (2) the polymerization raw material The step of supplying the polymer from the blender to the polymerization kettle and polymerizing it. [Selection figure] None
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11340528-B2
priorityDate 2017-11-24^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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