| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9a59dd01f1d059ff59927f5cd652d9ac |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-24585
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-30433
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-24514
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-04737
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-055
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0473 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3171
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-48 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-16 |
| filingDate |
2017-02-27^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a756679c6e42f22cf9281121e33bcac
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70885f1379d3ed5f4b2a6ec2ffdf985a |
| publicationDate |
2018-09-13^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2018142434-A |
| titleOfInvention |
Ion implanter |
| abstract |
Calibration accuracy of beam energy measurement in an ion implantation apparatus is improved. An ion implantation apparatus 100 includes an ion source 10 capable of outputting a calibration ion beam including multivalent ions having a known energy corresponding to an extraction voltage, a mass analysis magnet 22a, and a high-energy multistage linear acceleration unit 14. An upstream beam line 102 including: an energy analyzing magnet 24; a beam energy measuring device 200 for measuring the energy of a calibration ion beam downstream of the energy analyzing magnet 24; and a known energy and beam energy measuring device 200. A calibration sequence unit that creates an energy calibration table that represents a correspondence relationship with the energy of the calibration ion beam. The upstream beamline pressure is adjusted to the first pressure during the ion implantation process and to a second pressure that is higher than the first pressure while creating the energy calibration table. [Selection] Figure 8 |
| priorityDate |
2017-02-27^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |