| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-202 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-38 |
| filingDate |
2018-07-05^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be835a103388ce1c8816005f37adda0b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c59485851f31050bab7984e3210153a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_156cd0ccfd8d84e45134f77d4f5933a4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b0ec1dfbfd7c3ac2c38ce7d6fd39bba |
| publicationDate |
2018-11-22^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2018185529-A |
| titleOfInvention |
Composition comprising block copolymer and photolithography method |
| abstract |
During immersion lithography processing, resist material is reduced from leaking into an immersion fluid in contact with a resist layer. (A) A photoresist composition comprising a block copolymer comprising one or more resins, a photoactive component, and at least three distinct blocks of at least one different from the one or more resins on a substrate. And (b) a method of treating a photoresist composition comprising subjecting the photoresist layer to immersion exposure with radiation that activates the photoresist composition. The one or more block copolymers include a sulfonamide in which a sulfono (SO2) moiety is directly bonded to a nitrogen atom and the nitrogen atom is directly bonded to a hydrogen atom, and further includes one or more photoacid labile groups It is characterized by including. [Selection figure] None |
| priorityDate |
2008-11-19^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |