http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019135324-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d425bb3fcf6fed90cdd1fc040ba98b01 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22C19-07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3407 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3414 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22C1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F3-15 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-851 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F3-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22C19-07 |
| filingDate | 2018-09-21^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf7fae6986382f6f93a88e92f2dd548b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e1a77dcba35fbb008d06decb034fed9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_acb77484c691b285ec413e2121e00d20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ffffb7eab4207eb6a585760a50e8dca9 |
| publicationDate | 2019-08-15^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2019135324-A |
| titleOfInvention | Sputtering target containing cobalt / chromium / platinum / boron / rhenium, layer containing cobalt / chromium / platinum / boron / rhenium and process for producing the same |
| abstract | The present invention relates to a sputtering target including cobalt / chromium / platinum / boron / rhenium, a layer including cobalt / chromium / platinum / boron / rhenium, and a method of manufacturing the same. In the sputtering target containing cobalt / chromium / platinum / boron / rhenium of the present invention, based on the total number of atoms, the cobalt content is greater than 50 atomic percent, the chromium content is 2 atomic percent or more and 18 atomic percent or less, platinum content is 9 atomic percent or more and 30 atomic percent or less, boron content is 2 atomic percent or more and 14 atomic percent or less, rhenium content is 2 atomic percent or more and 8 atomic percent or less is there. By controlling the components of the sputtering target including cobalt / chromium / platinum / boron / rhenium, the probability of misfire can be greatly reduced, and the stability during sputtering can be further increased. [Selection] Figure 1 |
| priorityDate | 2018-02-05^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
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