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filingDate 2019-07-22^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e939080a1664b1e44076c265e1ba0c78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7067760fcdd12d949e5521826a7d3b07
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publicationDate 2020-03-26^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2020047913-A
titleOfInvention Post-etch residue cleaning composition and method of using same
abstract A cleaning composition for a microelectronic device (semiconductor substrate) and a method for using the same are provided. A microelectronic device (semiconductor substrate) cleaning composition comprising water, oxalic acid, and two or more corrosion inhibitors. [Selection diagram] None
priorityDate 2018-07-24^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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