| abstract |
PROBLEM TO BE SOLVED: To provide a new chemical composition which is transparent and has high sensitivity and may be suitable as a thick photoresist. SOLUTION: A polymer having a C 6-30 hydroxyaromatic group, a solvent, and a formula (I) A photoresist composition comprising a sulfonium salt having (in the formula, in formula (I), R, R 1 to R 8 , X, n, and R f are the same as those described herein). .. [Selection diagram] Fig. 1A-1C |