http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021155427-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D327-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D317-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00 |
| filingDate | 2021-06-14^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_153d9ab45d90d19234e4e5282fb77563 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4904ffc3b7e31e3855846fcf0d3dc9c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 |
| publicationDate | 2021-10-07^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2021155427-A |
| titleOfInvention | Method for producing salt, acid generator, resist composition and resist pattern |
| abstract | PROBLEM TO BE SOLVED: To provide a salt capable of producing a resist pattern having good CD uniformity (CDU) and a resist composition containing the salt. During A salt having an anion represented by the formula (aa2) [formula (aa2), X a and X b each independently represent an oxygen atom or a sulfur atom. Ring W 1 and ring W 2 independently represent a ring or the like represented by the formula (w1-1), and the hydrogen atom contained in the ring may be substituted with a hydroxy group or the like. L b1 represents a group or the like represented by the formula (b1-2). Q 1 and Q 2 independently represent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms. ]. [Selection diagram] None |
| priorityDate | 2016-02-29^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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