http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2022014961-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_129e393582e6bdf4029baf2206522f45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D7-63 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L63-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G65-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D181-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-544 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-5435 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L81-06 |
| filingDate | 2020-07-08^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d2678a40d3d0818210889a4bdb430cc0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_060d71f6e6341c765439e0badb7e7571 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ffaa8362dccf51ceab3721ecb2e8bc17 |
| publicationDate | 2022-01-21^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2022014961-A |
| titleOfInvention | Resin composition, shatterproof film and cover glass |
| abstract | PROBLEM TO BE SOLVED: To form a resin composition which is excellent in coatability even for curved glass having a small radius of curvature, has high impact resistance and anti-scattering property even with a thin film of 20 μm or less, and has high heat resistance. To provide things. An aromatic polysulfone resin having at least (A) a molecular structure having a repeating unit represented by the general formula (1) and / or the general formula (2), (B) an adhesion improver, (C). A resin composition having a cross-linking agent, (D) an organic solvent and (E) a surfactant, wherein the hydroxyphenyl terminal group ratio of the (A) aromatic polysulfone resin is 60 mol% or more, and the weight absolute average molecular weight ( A resin composition having Mw) of 30,000 or more and 80,000 or less. [Selection diagram] None |
| priorityDate | 2020-07-08^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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