Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2204-08 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C23-006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C15-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C19-00 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C19-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C23-00 |
filingDate |
2001-04-20^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2007-09-12^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2007-09-12^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-3975321-B2 |
titleOfInvention |
Silica glass substrate for photomask and method for planarizing silica glass substrate for photomask |
priorityDate |
2001-04-20^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |