http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4687095-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C43-23 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C39-15 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2004-12-14^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-05-25^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-05-25^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-4687095-B2 |
| titleOfInvention | Resist compound and radiation-sensitive composition |
| abstract | <P>PROBLEM TO BE SOLVED: To provide a resist compound that is useful not only for ultraviolet rays such as an i-line and a g-line but for radiations such as excimer laser light of KrF, etc., electron beams, extreme-ultraviolet rays (EUV), X-rays, etc., a radiation-sensitive composition and to provide a solvent-soluble nonpolymer-based radiation-sensitive resist having high sensitivity, high resolution and high heat resistance by a simple production process. <P>SOLUTION: The compound represented by a specific chemical structural formula, and the radiation-sensitive composition comprising the compound and an acid generator are provided. Since a pattern having high resolution and high purity is made by using the radiation-sensitive composition, a semiconductor element having high degree of integration is produced in high productivity. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
| priorityDate | 2004-12-14^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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