http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4848843-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2006-05-30^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-12-28^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-12-28^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-4848843-B2 |
| titleOfInvention | Polymer, radiation-sensitive resin composition, and resist pattern forming method |
| priorityDate | 2006-05-30^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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