| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K2101-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3346
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-82
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32366
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-427
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32743
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K10-003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2017-03-31^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-09-02^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2020-09-02^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-6749275-B2 |
| titleOfInvention |
Outer mask, plasma processing apparatus, and photomask manufacturing method |
| priorityDate |
2017-03-31^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |