http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H02112289-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_02ff914937eb6ceaee5ca69cc56cbfa7 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L39-24 |
filingDate | 1988-10-21^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b760d3a6a41925802c2432dcedc64325 |
publicationDate | 1990-04-24^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H02112289-A |
titleOfInvention | Device for manufacture of tunnel type josephson junction |
abstract | PURPOSE: To measure a fine defect of a tunnel barrier by providing a scanning tunnel microscope which enables measurement without breaking vacuum. n CONSTITUTION: A substrate is put in a superconductor film formation chamber 11, a film of Nb is sputter-formed by using an Nb sputtering device 14, and a lower electrode Nb 21 is formed. Then a film of Al is formed by using an aluminum sputtering device 15 as an overlayer Al 22. The substrate is transferred to a formation chamber 12 through a valve 16, oxygen is introduced by using a valve 17 for heat oxidation, a surface of the overlayer Al 22 is oxidized, and AlO x 23 is formed as a tunnel barrier. After formation of the tunnel barrier, the surface thereof is observed by using an STM 13 inside the formation chamber 12. If only AlO x 23 of a uniform film thickness is formed on the surface of the overlayer Al 22, an STM image is a reflection of corrugation of the lower electrode Nb 21. Meanwhile, if the lower electrode Nb 21 is exposed during oxidation and NbO x 24 is produced, a discontinuous area appears in the STM image. Since defects such as a pin hole of a tunnel barrier can be detected readily and securely by this device, yield can be improved. n COPYRIGHT: (C)1990,JPO&Japio |
priorityDate | 1988-10-21^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
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