http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0244342-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C7-30529 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C7-305 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C7-384 |
| filingDate | 1988-08-04^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_801dabf7a96545014e59ee0b633c4672 |
| publicationDate | 1990-02-14^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H0244342-A |
| titleOfInvention | Silver halide color photographic sensitive material and image forming method therewith |
| abstract | PURPOSE:To make it possible to rapidly process the subject material, and to improve the sensitivity and the processing stability of the material, and to suppress the generation of a fog in the material by incorporating a specified 5-pyrazolone coupler and a specified monodisperse cubic silver halide emulsion in the photosensitive layer contg. in the photosensitive material, respectively. CONSTITUTION:At least one kind of the 5-pyrazolone coupler having a releasible group shown by formula I at the coupling position of a pyrazolone nucleus, and at least one kind of the monodisperse cubic silver halide emulsion contg. a gold compd. are incorporated in at least one layer of the photosensitive layers. In the formula, L1 and L2 are each methylene or ethylene group, (l) and (m) are each 0 or 1, R1 is hydrogen atom or alkyl group, etc., R2 is a group capable of linking to the group A with carbon atom, etc., A is carbon atom or sulfur atom, (n) is 1 or 2, B is carbon atom or oxygen atom, etc., X is an atomic group necessary for forming a ring. Thus, a picture which has the high sensitivity over a broad exposure and illuminance region and less tendency for generating a fog and a pressure fog during the processing the photosensitive material, is obtd., and the processing stability of the material is improved. |
| priorityDate | 1988-08-04^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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