http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0510828-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1476752f2420c8f8eb53464cf7fc922b
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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01C17-003
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01C1-142
filingDate 1991-07-03^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57b0a3dd6738470ea0e64652b874433b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6fc6326c7d5d5e6eea9c53720cd170d9
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publicationDate 1993-01-19^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0510828-A
titleOfInvention Method for manufacturing platinum temperature sensor
abstract (57) [Abstract] [Purpose] A method of manufacturing a platinum temperature sensor in which a groove is formed in a platinum film formed on an insulating substrate to obtain a meandering resistance circuit. , This makes it possible to provide a high resistance value and to downsize the platinum temperature sensor. [Structure] A resist film 13 is formed on a platinum film 12 formed on an insulating substrate 11, and the resist film 13 is patterned by photolithography. Using the patterned resist film 13 as a mask, the platinum film 12 is subjected to microfabrication etching with Ar + ions, The groove 14 is formed. Due to the formation of the groove 14, a meandering pattern portion 15 which provides a resistance circuit is formed on the platinum film 12.
priorityDate 1991-07-03^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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