| abstract |
(57) [Summary] [Structure] a) Solid film-forming polyphenols, b) Formula I [n: 2, 3 or 4; Ar: n-valent benzene group or naphthalene group, or Formula II (Q: direct bond, -O-, -SO-,- SO 2- , -CH 2- , -C (CH 3 ) (phenyl)-or -C (CH 3 ) 2- ) divalent group; R 1 and R 2 : C 1 -C 8 alkyl group, or an unsubstituted or C 1 -C 4 alkyl-substituted phenyl group or naphthyl group, or R 1 and R 2 together form a 1,2-phenylene group or-[C (R ') ( Forming 2, 3 or 4)] of the compound, and c) under the actinic radiation, the acid:;: - R ")] m (R ' and R" m H, carbon C 1 -C 4 alkyl group or a phenyl group A photosensitive composition comprising a compound that [Effect] It can be developed without swelling in an aqueous alkaline solution and is useful as a negative resist in the production of printing plates, printed circuits and integrated circuits. It can be used for the production of protective coatings and relief structures. [Chemical 1] |