http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0565637-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_be92719b856db86c092cc233e9512ca2 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-46 |
filingDate | 1991-09-05^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e7927488a53ad971a2a09d997894c5f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b931df08c8d4a3c653ea400097a919c |
publicationDate | 1993-03-19^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H0565637-A |
titleOfInvention | Ion beam sputter device |
abstract | (57) [Abstract] [Purpose] When forming a thin film of cubic boron nitride (c-BN) on the surface of a substrate, the utilization efficiency of raw materials and the controllability of the synthesis process are good by a high vacuum and low temperature process. Moreover, it is an object of the present invention to provide an ion beam sputtering apparatus which has excellent adhesion of the coating and is useful for improving the function. [Structure] Ion source 5 for sputtering in vacuum chamber 1 And an ion source 12 for assist irradiation and a composite target 4 of two elements in which a h-BN sintered body target and an Al target are provided in a specific surface area ratio, and the ions from the ion beam source 5 for sputtering are arranged. The material on the surface of the composite target 4 is sputter-evaporated by the beam and directed toward the base body 9, and the surface of the base body 9 is irradiated with assist ions mainly composed of nitrogen ions from the assist irradiation ion source 12 so that the c-BN layer and the AlN layer are irradiated. A thin film having a graded composition of layers is formed on the substrate 9. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5679494-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100537014-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9219111-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7700167-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009538980-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013035325-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9028923-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0043564-A1 |
priorityDate | 1991-09-05^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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