http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0565637-A

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Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_be92719b856db86c092cc233e9512ca2
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-46
filingDate 1991-09-05^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e7927488a53ad971a2a09d997894c5f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b931df08c8d4a3c653ea400097a919c
publicationDate 1993-03-19^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0565637-A
titleOfInvention Ion beam sputter device
abstract (57) [Abstract] [Purpose] When forming a thin film of cubic boron nitride (c-BN) on the surface of a substrate, the utilization efficiency of raw materials and the controllability of the synthesis process are good by a high vacuum and low temperature process. Moreover, it is an object of the present invention to provide an ion beam sputtering apparatus which has excellent adhesion of the coating and is useful for improving the function. [Structure] Ion source 5 for sputtering in vacuum chamber 1 And an ion source 12 for assist irradiation and a composite target 4 of two elements in which a h-BN sintered body target and an Al target are provided in a specific surface area ratio, and the ions from the ion beam source 5 for sputtering are arranged. The material on the surface of the composite target 4 is sputter-evaporated by the beam and directed toward the base body 9, and the surface of the base body 9 is irradiated with assist ions mainly composed of nitrogen ions from the assist irradiation ion source 12 so that the c-BN layer and the AlN layer are irradiated. A thin film having a graded composition of layers is formed on the substrate 9.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5679494-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100537014-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9219111-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7700167-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009538980-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013035325-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9028923-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0043564-A1
priorityDate 1991-09-05^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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