Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1e8ba6870e42607109689c74072ca5d3 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-34 |
filingDate |
1992-10-27^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa4c4fb87e8935524ea70e2ced7aa48a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_496900acd423d5a9f91405ce9c2f6935 |
publicationDate |
1994-05-17^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-H06134256-A |
titleOfInvention |
Hazardous gas purification method |
abstract |
(57) [Summary] [Objective] To remove harmful nitrogen fluorides such as nitrogen trifluoride, dinitrogen tetrafluoride and dinitrogen difluoride contained in the gas discharged from the semiconductor manufacturing process. [Structure] A gas containing nitrogen fluoride such as nitrogen trifluoride is passed through a purifying cylinder and brought into contact with a purifying agent mainly containing metallic zinc and metallic aluminum under heating. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6514471-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6106790-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9809715-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6767513-B1 |
priorityDate |
1992-10-27^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |