http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06220151-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_758994071efb42b565fc2c04637be131
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-76
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24
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filingDate 1993-01-22^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f90e5864cd85e4310d6c956c2b3d83ef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d43a1aa32beb4596bef83c4800025ad
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publicationDate 1994-08-09^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H06220151-A
titleOfInvention Polyurethane resin for abrasives
abstract (57) [Abstract] [Purpose] To provide a polyurethane resin for abrasives, which has sufficient hardness, abrasion resistance and alkali resistance. [Structure] A polymer diol (a) containing 70% by weight or more of polyoxytetramethylene glycol having an average molecular weight of 2500 to 5000, 4,4'-diphenylmethane diisocyanate (MDI), and a low molecular diol having a molecular weight of 100 or less (b). A polyurethane resin for abrasives, wherein the content of nitrogen atoms derived from the MDI is 5.5 to 7.0% by weight of the resin.
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priorityDate 1993-01-22^^<http://www.w3.org/2001/XMLSchema#date>
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