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filingDate 1993-12-28^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4e91120a1a101082106abb056d999bf9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b1b62c26009f647cc5296e95a1bccc4
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4ab1b0e6bb2e33ae8ed39e6ba7b00f54
publicationDate 1994-10-07^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H06283622-A
titleOfInvention Multilayer interconnect metal structure and method of forming same
abstract (57) [Abstract] [Purpose] Realization of a structure and method for preventing metal diffusion between a noble metal layer and an adjacent non-noble metal layer, and in particular, a super barrier structure between copper and an adjacent noble metal layer. To provide a new structure and method for doing so. According to the present invention, the non-noble metal layer 16, the titanium layer 17, This is accomplished by sequentially depositing the molybdenum layer 18 and the layer 20 of noble metal or relatively less noble metal as the metal for interconnection. The present invention also provides It also concerns an improved multi-layered metal pad or structure for connecting to at least a portion of a pin, connector, or wiring to a substrate.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2005079119-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7531832-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100850754-B1
priorityDate 1993-01-08^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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