http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H063819-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_385752f237551ca1b257f160a0f2434b |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 1992-06-18^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8cf70444bb95e3603b1194156d497936 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b83db5b8502bf9063ffe089869b77c3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c7ef17bfb96d8609575fc61c35baf88d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_938c751b7d7e96d034353466eb01f329 |
| publicationDate | 1994-01-14^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H063819-A |
| titleOfInvention | Radiation-sensitive resin composition for dry development |
| abstract | (57) [Summary] [Object] To provide a radiation-sensitive resin composition for dry development, which has high sensitivity and high resolution and can be applied to various radiations including deep ultraviolet rays such as KrF excimer laser. [Structure] (1) Phenolic hydroxyl group-containing resin and 1, 2 -A naphthoquinone diazide-4-sulfonic acid ester compound, and / or (2) a resin in which a part of the phenolic hydroxyl group in the phenolic hydroxyl group-containing resin is 1,2-naphthoquinone diazide-4-sulfonic acid ester is contained. A radiation-sensitive resin composition for dry development, comprising: |
| priorityDate | 1992-06-18^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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