| abstract |
(57) [Summary] [Objective] To provide a magnetron cathode suitable for in-line operation mode under low discharge voltage and / or working pressure. [Structure] A device for generating plasma by cathode sputtering and microwave irradiation, a dc and / or ac power source 10 is connected to a cathode 9, and microwaves oscillate in a region between the cathode and the substrate 5. To be done. The magnetic fields 22, 2 of the magnetron are generated by this microwave. Plasma is generated in the three regions, where electron cyclotron resonance occurs and microwaves are absorbed in the plasma. |