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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B7-02
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B13-00
filingDate 1992-12-11^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_845907449fa77652423b9576a0b93113
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4df9176fa098145fea08a8df81470362
publicationDate 1994-04-12^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0699536-A
titleOfInvention Gas barrier transparent conductive laminate and method for producing the same
abstract (57) [Summary] [Structure] Plasma C using at least an organic silicon compound gas and oxygen as raw materials for polymer film base materials such as polyether sulfone and polyether ether ketone. A gas barrier transparent conductive laminate, in which a silicon oxide layer formed by the VD method and a transparent conductive layer are appropriately laminated. [Effect] A transparent conductive film having transparency, flexibility, and high gas barrier property, which is suitable for application to a liquid crystal display device in which water vapor and oxygen must be avoided, is provided.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000285752-A
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priorityDate 1992-08-07^^<http://www.w3.org/2001/XMLSchema#date>
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